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We offer a choice of R&D configurations for our sputtering thin film deposition systems. Using all known sputtering sources including DC and RF magnetron sputtering we are covering reactive and non reactive sputtering with and without DC Bias, as well as reverse sputtering for substrate cleaning. The sample temperature can be controlled from cryogenic temperatures (4 Kelvin) to high temperature (1200 K) during thin film deposition. Sample translation and rotation can be combined with sophisticate load lock sample manipulation. A completely automated Process Control System is furnished to ensure a reliable, repeatable and high quality coating process. OMNICONVAC II is the most powerful control system available for our vacuum thin film deposition systems.
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